DEFECTS IN SPUTTER-DEPOSITED TITANIUM FILMS, STUDIED BY POSITRON ANNIHILATION AND X-RAY DIFFRACTION

N. Nancheva1, N. Feschiev2, M. Misheva3, N. Djurelov3, Tz. Kotlarova4, D. Elenkov5

1 Department of Physics, Technical University, Russe 7017, Bulgaria,
2 Department of Metal Science, Technical University, Russe 7017, Bulgaria,
3 Faculty of Physics, University of Sofia, Sofia 1126, Bulgaria,
4 Department of Physics, Technical University, Plovdiv 4000, Bulgaria,
5 Institute of Nuclear Research and Nuclear Energy, Sofia 1784, Bulgaria

Titanium films, grown on lead and glass substrates via d.c. magnetron sputtering, have been studied using positron annihilation spectroscopy and X-ray diffraction technique. Diffraction measurements indicate considerable residual stresses and dislocation densities - r ~(1.1-1.9) x 1011 cm-2. Positron lifetime technique shows the presence of different kinds of defects in Ti/Pb and Ti/glass films.