A. Dróździel1, K. Kornarzyński2, J. Romanek1, D. Mączka1, A. Latuszyński1
1 Institute of Physics, Maria Curie-Sklodowska University, Pl. M. Curie-Sklodowskiej 1, 20-031 Lublin, Poland
2 Institute of Physics, Agriculture University, Lublin, Poland
To study the secondary ion emission the special apparatus had been designed and constructed by which measurements of current intensity of positive and negative ions generated in this process were performed. The article presents the characteristics of current intensities of positive and negative ions sputtered from a source in dependence on the energy and intensity of bombarding argon ions, voltage and current of arc discharge as well as extraction voltage of ions from the area of a sputtered electrode. From these characteristics the coefficients of secondary ion emission were determined for Al, Ti and Cu targets. It has been shown that the constructed apparatus can be also used for production of positive and negative ions for ion implantation purposes.