COMPARISON OF PERMITTIVITY OF ION IMPLANTED SILICON AND SILICON BOMBARED WITH NEUTRONS

P. Żukowski, J. Partyka, P. Węgierek, M. Kozak

Lublin Technical University, Faculty of Electrical Engineering, 38A Nadbystrzycka Str., 20-618 Lublin, Poland


The present work includes a comparison of permittivity variations in the silicon irradiated with neutrons and additionally implanted with ions, the changes occurring in the course of thermal annealing.